Preparation and Characteristic of AlN Thin Film by RF Magnetron Sputtering
碩士 === 國立成功大學 === 材料科學(工程)研究所 === 83 === The RF magnetron sputtering technique was employed in this study to obtain AlN thin films on silicon and glass substrat- es. The reaction atmosphere was a mixture of argon and nitr- ogen and the sel...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89860094719100628610 |