| Summary: | 博士 === 國立交通大學 === 電子研究所 === 83 === This dissertation presents the depostion processes and physical
properties of ZrTiO4-based dielectric thin films in this
research, including the fabrication of PLZT ferroelectric thin
film by sol-gel spin coating and the preparation of ZrTiO4
dieletric thin film by RF magnetron sputtering method. In sol-
gel spin coating process, the precursor solution were formed by
mixing lead acetate hydrate,lanthanum nitrate hydrate,
zirconium n-propoxid and tetrabutylorthotitanate and
2-methoxyethanol as solvent was used. The effects of the drying
control chemical additives, annealing temperature and duration
on the qualities of the PLZT film were studied. Depostion of
ZrTiO4 thin film was carried out in a magnetron sputtering
system and the target (ZrTiO4 powder) preparated via solid-
state reaction. To our knowledge, it was the first time that
depostion of high quality dieletric ZrTiO4 thin films was
realized. The properties of ZrTiO4 thin film (such as physical,
electrical, optical and mechanical properties) were studied
utilizing various thin film analysis techniques.
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