Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate

碩士 === 國立交通大學 === 電子研究所 === 83 === Indium tin oxide (ITO) were deposited onto unheated glass and polycarbonate substrates by r.f. magnetron sputtering. The properties of ITO films prepared at various r.f. powers and oxygen percentages are...

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Bibliographic Details
Main Authors: Jen-Huan Tasi, 蔡政翰
Other Authors: Bi-Shiou Chiou
Format: Others
Language:en_US
Published: 1995
Online Access:http://ndltd.ncl.edu.tw/handle/28015502825777359884