Influences of sputtering power and oxygen percentage on the properties of R. F. magnetron sputtered ITO films and the design of antireflective coating for ITO films deposited on glass substrate
碩士 === 國立交通大學 === 電子研究所 === 83 === Indium tin oxide (ITO) were deposited onto unheated glass and polycarbonate substrates by r.f. magnetron sputtering. The properties of ITO films prepared at various r.f. powers and oxygen percentages are...
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/28015502825777359884 |
| Summary: | 碩士 === 國立交通大學 === 電子研究所 === 83 === Indium tin oxide (ITO) were deposited onto unheated glass and
polycarbonate substrates by r.f. magnetron sputtering. The
properties of ITO films prepared at various r.f. powers and
oxygen percentages are investigated. It is found the
refractive index of ITO film decreases with decreasing r.f.
power and with increasing oxygen percentage. The refractive
index of the as-deposited film ranges from 1.87 to 2.17. The
feasibility of the multilayer antireflective (AR) coating
design with ITO films of various refractive indices is explore
in this study.
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