Study of polycrystalline silicon thin film transistors
碩士 === 國立交通大學 === 應用化學系 === 83 === The solid pases recrystallization of amorphous silicon ( α-Si ) films deposited by a low-pressure chemical vapor deposition system using disilane (Si2H6) gas at various annealing conditions are investigate...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1995
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| Online Access: | http://ndltd.ncl.edu.tw/handle/57694513232941617495 |