Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application

博士 === 國立交通大學 === 電子研究所 === 83 ===

Bibliographic Details
Main Author: 邱榮照
Other Authors: Cai, Chun-Jin
Format: Others
Language:zh-TW
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/91148812354627573572