偏壓控制熱燈絲化學氣相沉積法在高速鋼上成長鑽石薄膜之研究
碩士 === 國立中興大學 === 機械工程研究所 === 83 === Bias-controlled hot filament chemical vapor deposition (HFCVD) system has been set up for the synthesis of diamond films. Silicon wafer was chosen as substrate to study the processing parameters of the system. Five commercial hard films was chosen as buffe...
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| Format: | Others |
| Language: | zh-TW |
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1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49207985940929292395 |