| Summary: | 碩士 === 國立臺灣科技大學 === 化學工程研究所 === 83 === In tihis thesis, we explored the application of cathodic arc
plasma technique in the deposition of (i)diamond-like film,
(ii) hard films such as TiN, TiC and TiCN. Diamond-like film
was deposited using high density graphite (1.92 g/cm3) as
target and nitrogen as arc-sustaining gas. Film structure was
influenced by parameters like arc current, background gas
pressure and substrate bias voltage. Optimum condition was
achieved as 35-40 ampere arc current, 0.01 torr background
pressure, and -300 to -500 volt bias voltage. TiN, TiC and
TiCN Films were deposited using Ti metal as target, and the
mixture of N2 with CH4 or C2H2 as sustaining gas. From X-
ray diffraction data, we found that TiN was
preferentially grown in（111）direction, while TiC was in（220
） direction, and higher crystallinity was achieved using CH4
as compared to C2H2. In conclusion, applicability of
cathodic arc plasma technique in depositing both diamond-
like film and Ti-based hard films was demonstrated, film
structure and property were correlated to deposition parameters.
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