Optical characterization and analysis of a-Si:H thin films
碩士 === 國立中興大學 === 材料工程學研究所 === 84 === The hydrogenated amorphous silicon (a-Si:H) thin films grown by Plasma Enhanced Chemical Vapor Deposition method containhydrogen atoms up to 10 atomic percentage. The hydrogen atoms in the network have...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
1996
|
Online Access: | http://ndltd.ncl.edu.tw/handle/71687599334477711281 |