Optical characterization and analysis of a-Si:H thin films
碩士 === 國立中興大學 === 材料工程學研究所 === 84 === The hydrogenated amorphous silicon (a-Si:H) thin films grown by Plasma Enhanced Chemical Vapor Deposition method containhydrogen atoms up to 10 atomic percentage. The hydrogen atoms in the network have...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71687599334477711281 |