The effects of plasma nitriding and TiAl interlayer on the TiAlN films
碩士 === 國立成功大學 === 材料科學(工程)學系 === 84 === TiAlN films were deposited on high speed steel (H.S. S.) by reactivemagnetron sputtering. The effects of plasma nitriding of substrate and TiAlinterlayers on the TiAlN films were investi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36648159648937491107 |