Investigation of InGaAs/GaAs Metal-Insulator-Semiconductor (MIS) Like Heterostructure High-Speed Devices

碩士 === 國立成功大學 === 電機工程研究所 === 84 === In this thesis, we will discuss two kinds of InGaAs-GaAs heterostructure graded doped-channel MIS-like FET. The main advantage of graded doped-channel MIS-like FET''s is li- kely doped-channel MIS-like FET�...

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Bibliographic Details
Main Authors: Cheng-Zu Wu, 吳承儒
Other Authors: Wen-Chau Liu
Format: Others
Language:en_US
Published: 1996
Online Access:http://ndltd.ncl.edu.tw/handle/62054248820133553317
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Summary:碩士 === 國立成功大學 === 電機工程研究所 === 84 === In this thesis, we will discuss two kinds of InGaAs-GaAs heterostructure graded doped-channel MIS-like FET. The main advantage of graded doped-channel MIS-like FET''s is li- kely doped-channel MIS-like FET''s(DMT''s). Comparing to DMT''s, it better confinement in the channel, great feasibility for improvement of device linearity and large logic swing noise margin. We can moldulate the gate voltage swing range by gr- unique properties and potential for high-speed,high-frequency, hgih power and large input signal circuit applications. In addition, we also discussion two kinds of multiple negative- differential-resistance (MNDR) switching devices, based on InGaAs-GaAs metal-insulator-semiconductor (MIS) li- ke structure with a step-graded InGaAs quantum well. Due to its capability of reducing circuit complexity, the MNDR concept has become more interesting in the recent studied. The performance of these two MNDR devices are different from the previously reported NDR switching device and has not been fo- und for other devices. The impressive MNDR behaviors are bel- believed to be caused by the sequential accumulation process of InGaAs subwells nd the successive barrier lowering and potential redistribution effect. The interesting property provides apromise of the studied structures to be a good condiate switching device applications.