Effects of Processing Atmosphere and Active Metal Films on Spreading Ability of Brazing Alloys on Diamond Films
碩士 === 國立交通大學 === 材料科學與工程研究所 === 84 === Diamond films were deposited on N-type Si(100) substrates by microwave plasma chemical vapor deposition (MPCVD) system with CH4 and H2 as the reactantgases. Diamond films were characterized by -...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/96840429747772491972 |