Chemical-Mechanical Polishing and Material Characterization of Low Dielectric Constant PECVD Fluorinated Oxide Thin Films
碩士 === 國立交通大學 === 材料科學與工程研究所 === 84 === Advanced semiconductor device interconnects are the pivotal component governing the final device yield and reliability. The trend toward shrinking design rules and increased interconnect pack...
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| Format: | Others |
| Language: | zh-TW |
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1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52928629850932934772 |