Basic Characteristics and Selective Deposition of Cu CVD
碩士 === 國立交通大學 === 電子研究所 === 84 === Copper has an excellent electrical conductivity as well as electromigrationresistance. It has been regarded as a potential conductor material to replacethe aluminum based interconnect system for the fut...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/81968417351363828398 |