Simulation and Characterization of Submicrometer n-MOSFETs

碩士 === 國立交通大學 === 電子研究所 === 84 === The extraction techniques for submicrometer LDD n-MOSFETs with the Reverse-Short-Channel Effect(RSCE) are described, which include theeffective channel length, implant profiles in channel and source/drainr...

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Bibliographic Details
Main Authors: Yang, Shih-Hsien, 楊士賢
Other Authors: Wu Ching-Yaun
Format: Others
Language:zh-TW
Published: 1996
Online Access:http://ndltd.ncl.edu.tw/handle/22468446360305906909