The Application of CMP on Polysilicon Oxide
碩士 === 國立交通大學 === 電子研究所 === 84 === The surface of the polysilicon film polsihed with CMP is smoother than that of the unpolished poysilicon film and they are observed by AFM. The polyoxide grown thermally from the polished polysilicon film...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79106976791483785431 |