Investigation on Mechanism of Selective LPD and its Application
碩士 === 國立交通大學 === 電子研究所 === 84 === Liquid Phase Deposition (LPD) is a low temperature technique. A LPD oxide can be prepared at room temperature (35 ℃ ). A unique property of selectivity deposition against photoresist has be...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/51110457029904106025 |