Monte Carlo Simulation of Sputtering in Multicomponent Target
碩士 === 國立交通大學 === 電子研究所 === 84 === A Monte Carlo simulation program has been developed to calculate sputtering yields of multicomponent targets such as alloys, oxides and silicides. A preferential phenomenon has been studied by the effe...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93903103356155464841 |