Monte Carlo Simulation of Sputtering in Multicomponent Target

• Main Authors: Tsay, Wen-Long, 蔡文隆
• Other Authors: Guo Shuang-Fa
• Format: Others
• Language: zh-TW
• Published: 1996
• Online Access: http://ndltd.ncl.edu.tw/handle/93903103356155464841

碩士 === 國立交通大學 === 電子研究所 === 84 === A Monte Carlo simulation program has been developed to calculate sputtering yields of multicomponent targets such as alloys, oxides and silicides. A preferential phenomenon has been studied by the effects of mass and bonding energy. The main difference between this work and TRIM is the model of surface bonding energy. In this program different component has different bonding energy in the multicomponent targets. In TRIM the same average surface bonding energy has been adopted for every component of the target. So it can be explained more easier that the component with lower surface bonding energy is preferred sputtering. In this work Moliere, ZBL interatomic potential and LSS electronic stopping have been adopted, the simulated results show good agreement with the experimental data.