Fabrication of phase mask with RIE and its application in fiber gratings
碩士 === 國立中央大學 === 物理學系 === 84 === Phase mask has developed in Reactive Ion Etching system withCF4/O2 (19/1sccm) gas mixtures. The system provides RF power 30 wattand pressure 50 mtorr. The etching of phase mask under different control parameters is studie...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/28530310721950222341 |