Low Pressure Chemical Vapor Deposited Tungsten for ULSI Applications
博士 === 國立交通大學 === 電子工程學系 === 85 === This thesis studies properties of the low pressure chemical vapor deposited tungsten film (CVD-W) for ultra-large-scale- integrated (ULSI) circuit applications. The deposition mechanisms of selective CVD-W filling on su...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15972619170031560324 |