The Study of Basic Pollution on the Negative-Tone Chemically Ampified Resist
碩士 === 國立交通大學 === 應用化學研究所 === 85 === As semiconductor industries get into submicron age, the design concept for resists is directed to high sensitivity, high contrast and high resolution, hence, chemically amplified resists with photoacid generators have been developed and become the main stream...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/77095144687245479568 |