The experimental study of photoresist reduction for spin coating
碩士 === 國立中央大學 === 機械工程學系 === 85 === Spin coating is a process utilized by microelectroincs industry to from athin uniform film of photoresist or polyimide on silicon wafers.Since boththe prices of photoresist and polyimide are rather h...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60594891802113220314 |