The Fluid Simulation of Radio Frequency Plasma Chamber

• Main Authors: Hung, Shun Nan, 洪舜男
• Other Authors: Fu-Chu, Chou
• Format: Others
• Language: zh-TW
• Published: 1997
• Online Access: http://ndltd.ncl.edu.tw/handle/81465456936098581777

碩士 === 國立中央大學 === 機械工程學系 === 85 === This article used the numerical methods to solve the Boltzmann equation and to simulate the nature of radio frequency plasma chamber in the conditions of low pressure(less than a little Torr) and weak ionized(thecharged particle-to-neutrals ratio is below 1/10000). Consider the radio frequency power supplier using Fluid Model to solve the Boltzmann equation and to derive the equation of fluid transport. And,to compare the differences among the plasma density,velocity and therate of ionization under the effect of electric field and magn etric field.Results show a spiralize path due to increase of magnetric field. This will increase the chance of collision and obtain the lower velocity and higher plasma density. Secondly,to probe into the variable of effect the flow field of reaction chamber include the driving voltage and the pressure of reaction. Results show higher ionization and plasma density when the driving voltage is higher and increase of particle energy as well as reduction of plasma density due to lower pressure of reaction. High pasma density and high particleenergy can promote the rate of etching and deposit, to save the time of processes. In order to promote the plasma density, the driving voltage and the use of magnetic field have to be increased; while a higher particle energy can beobtained by adopting the lower pressure of reaction.