The numerical simulation research of spin coatting
碩士 === 國立中央大學 === 機械工程學系 === 85 === Spin coating is utilized extensively in the microelectronics industry to form a thin uniform film of photoresist or polyomide on silicon wafers.Dispensation time will affect the amount of liquid dispensed...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/86313719320162915921 |