Study and Fabrication of 250nm*250nm Contact Structure
碩士 === 國立清華大學 === 電機工程學系 === 85 === The contact behavior and long term reliability stress of Al- based /TiN/Tisi2 p+ n contact have been studied in this work .This was achived through the use of cross-bridge Kelvin contact resitancestructur...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85913810779705332183 |