Propert and reliability study on the ultra-thin oxides (3-5nm) grown by microwave plasma afterglow oxidation at low temperature in the mixtures of N2O and O2

碩士 === 國立清華大學 === 電機工程學系 === 85 ===

Bibliographic Details
Main Authors: Lu, Chun-wei, 呂俊衛
Other Authors: Huey-liang Hwang
Format: Others
Language:zh-TW
Published: 1997
Online Access:http://ndltd.ncl.edu.tw/handle/36987175125434281765