Fabrication by Electron-Beam Lithography and Analysis of Ultrafast Metal-Semiconductor-Metal Photodetectors
碩士 === 國立清華大學 === 電機工程學系 === 85 === Abstract There are two major parts in this thesis. One is to calibrate the newly setup SEM lithography system and to apply it to the fabrication of submicron Metal-Semiconductor-...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49922596207431954004 |