Fabrication by Electron-Beam Lithography and Analysis of Ultrafast Metal-Semiconductor-Metal Photodetectors
碩士 === 國立清華大學 === 電機工程學系 === 85 === Abstract There are two major parts in this thesis. One is to calibrate the newly setup SEM lithography system and to apply it to the fabrication of submicron Metal-Semiconductor-...
Main Authors: | Tang, Seng-Haung, 湯森煌 |
---|---|
Other Authors: | Sheng-Fu Horng |
Format: | Others |
Language: | zh-TW |
Published: |
1997
|
Online Access: | http://ndltd.ncl.edu.tw/handle/49922596207431954004 |
Similar Items
-
THE FABRICATION AND CHARACTERIZATION OF GaAs METAL- SEMICONDUCTOR-METAL PHOTODETECTORS
by: Hung-Chang Shieh, et al.
Published: (1995) -
Fabrication and Characterization of GaN Metal-Semiconductor-Metal Photodetectors
by: Ju-Lin Wu, et al.
Published: (2002) -
Fabrication and Characteristics of Si-Based Metal-Semiconductor-Metal Photodetectors
by: Li-Hong Laih, et al.
Published: (1999) -
The Fabrication of InGaP/GaAs Interdigitate metal-semiconductor- metal photodetectors
by: Lin, Kun Chih, et al.
Published: (1997) -
Fabrication and Investigation of InGaN-based Metal-Semiconductor-Metal Photodetectors
by: Ai-Ni Tu, et al.
Published: (2009)