A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER
碩士 === 國立臺灣大學 === 商學研究所 === 85 === As the competition in semiconductor market is getting more and more severe, quality improvement in manufacturing has become an important source of competitive advantage. During IC fabrication in a wafer fab, wafer outpu...
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ndltd-TW-085NTU003180472016-07-01T04:15:36Z http://ndltd.ncl.edu.tw/handle/46416386368512376478 A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER 結合統計製程管制之非連續批次製程控制--以半導體製程為例 HUANG, LI-SHIA 黃麗霞 碩士 國立臺灣大學 商學研究所 85 As the competition in semiconductor market is getting more and more severe, quality improvement in manufacturing has become an important source of competitive advantage. During IC fabrication in a wafer fab, wafer outputs might deviate from the target values because of process abnormality such as a drift in equipment or material performance. The traditional Shewhart control chart can not detect this kind of small drift quickly, which usually results in a significant quality loss. In order to solve this problem, this study provides a more sensitive statistical process control method to detect the small drift, and at the same time provides a cost-effective control algorithm to maintain the wafer outputs close to the target values. In this study, EWMA (Exponentially Weighted Moving Average) control chart is used to detect the small drift in a manufacturing process. In order to select the optimal weight in the EWMA control chart, both sensitivity and robustness are characterized using ARL1 (as a measurement of robustness) and ARL2 (as a measurement of sensitivity). This is accomplished by deriving the run length distribution using Markov-chain formulation. We also propose a cost-effective methodology for a run-by-run controller. The controller combines the advantages of statistical process control and feedback control. It adjusts the equipment settings only when EWMA control chart detects an abnormal trend. We use simulations to characterize the mean square error, false alarm, and adjustment number under different drift conditions and select an optimal weight for a minimum cost. As the simulation results demonstrate, the cost-effective run-by-run controller is able to maintain the process outputs close to the target in a drifting process with only few runs of adjustment. When the cost of adjusting the equipment settingsis significant or the underlying abnormal patterns are not certain, the benefits of cost-effective run-by-run controller can be further enhanced. RUEY-SHAN GUO, ARGON CHEN 郭瑞祥, 陳正剛 1997 學位論文 ; thesis 79 zh-TW |
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碩士 === 國立臺灣大學 === 商學研究所 === 85 === As the competition in semiconductor market is getting more
and more severe, quality improvement in manufacturing has become
an important source of competitive advantage. During IC
fabrication in a wafer fab, wafer outputs might deviate from the
target values because of process abnormality such as a drift in
equipment or material performance. The traditional Shewhart
control chart can not detect this kind of small drift quickly,
which usually results in a significant quality loss. In order
to solve this problem, this study provides a more sensitive
statistical process control method to detect the small drift,
and at the same time provides a cost-effective control algorithm
to maintain the wafer outputs close to the target values. In
this study, EWMA (Exponentially Weighted Moving Average) control
chart is used to detect the small drift in a manufacturing
process. In order to select the optimal weight in the EWMA
control chart, both sensitivity and robustness are characterized
using ARL1 (as a measurement of robustness) and ARL2 (as a
measurement of sensitivity). This is accomplished by deriving
the run length distribution using Markov-chain formulation.
We also propose a cost-effective methodology for a run-by-run
controller. The controller combines the advantages of
statistical process control and feedback control. It adjusts the
equipment settings only when EWMA control chart detects an
abnormal trend. We use simulations to characterize the mean
square error, false alarm, and adjustment number under different
drift conditions and select an optimal weight for a minimum
cost. As the simulation results demonstrate, the cost-effective
run-by-run controller is able to maintain the process outputs
close to the target in a drifting process with only few runs of
adjustment. When the cost of adjusting the equipment settingsis
significant or the underlying abnormal patterns are not certain,
the benefits of cost-effective run-by-run controller can be
further enhanced.
|
author2 |
RUEY-SHAN GUO, ARGON CHEN |
author_facet |
RUEY-SHAN GUO, ARGON CHEN HUANG, LI-SHIA 黃麗霞 |
author |
HUANG, LI-SHIA 黃麗霞 |
spellingShingle |
HUANG, LI-SHIA 黃麗霞 A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER |
author_sort |
HUANG, LI-SHIA |
title |
A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER |
title_short |
A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER |
title_full |
A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER |
title_fullStr |
A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER |
title_full_unstemmed |
A COST-EFFECTIVE METHODOLOGY FOR A RUN-BY-RUN EWMA CONTROLLER |
title_sort |
cost-effective methodology for a run-by-run ewma controller |
publishDate |
1997 |
url |
http://ndltd.ncl.edu.tw/handle/46416386368512376478 |
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