Control of Rapid Thermal Processor:Design for Better Temperature Uniformity
碩士 === 國立台灣工業技術學院 === 化學工程技術研究所 === 85 === The objective for RTP control is to achieve temperature uniformity. It is well known that the design of heating source impose an inherent limitation on best achievable temperature uniformity. In this work l...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/37954332934504802112 |