Characterization of Iridium Dioxide Thin Films Prepared by Reactive Sputtering Method
博士 === 國立台灣工業技術學院 === 電子工程技術研究所 === 85 === Iridium dioxide (IrO2) thin films, deposited on fused silica, Si and alumina substrates by reactive rf sputtering method under various conditions were characterized by atomic force microscopy (AFM), X-ray diffr...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71276055763795847945 |