An Investigation of High Dielectric Constant of RF-sputtered HfO2 Thin Films
碩士 === 國立雲林科技大學 === 電子與資訊工程技術研究所 === 85 === In this thesis, the Hafnium dioxide (HfO2) thin films are deposited on p-Si substrates by the radio-frequency(RF) magnetron sputtering system. The material and electric properties of the deposited HfO2 films before and after annealing process are studie...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1997
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| Online Access: | http://ndltd.ncl.edu.tw/handle/62974981089214242913 |