Optimization of LPCVD Reactors for the Deposition of Thin Films
碩士 === 國立中正大學 === 化學工程研究所 === 86 === The aim of this research is used optimal design to improve the process of LPCVD reactor for the deposition of polycrystalline thin films . Because the concentration of reactants is gradually decreasing for the duration of reaction , the deposition rate of films i...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/76894094216702684291 |