Study of Interfacial Reactions of Co/Si0.76Ge0.24/Si(100) by Pulsed KrF laser and Vacuum Annealing
碩士 === 國立成功大學 === 材料科學(工程)學系 === 86 === Interfacial reactions of Co/Si0.76Ge0.24 and Co(Si0.76 Ge0.24)/Si0.76Ge0.24 by vacuum annealing and pulsed KrF laser annealing as afunction o energy density and pulsed number were studied. For...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52334740140371375372 |