Analysis of Heat Transfer and Thermal Stress of Wafers in Rapid Thermal Processing Furnaces

碩士 === 國立交通大學 === 機械工程研究所 === 86 ===   This surdy investigates heat transfer and thermal stress of wafer in a rapid thermal processing -type oven used for semiconductor processes. Thermal st11resses that are induced by temperature nonuniformity due to a heat loss at the edge of the wafer are ca...

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Bibliographic Details
Main Authors: Liu, Yi-Rong, 劉宜榮
Other Authors: Chu, Hsin-Sen
Format: Others
Language:zh-TW
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/82924718743983149496