Fabrication and Simulation of AION Embedded Material for Attenuated Phase Shift Mask
碩士 === 國立交通大學 === 應用化學研究所 === 86 === The main objective of this thesis is to study the new embedded material for 193 nm EAPSM. Deposition of ALON thin films were carried out with DC plasma power 40 W, argon gas flow 40 sccm, nitrogen gas flow 2 sccm, oxygen gas flow 0.1 sccm and the flow time o...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/65578227826380405964 |