Chemical Vapor Deposition of Tungsten Carbonitride Thin Films
碩士 === 國立交通大學 === 應用化學研究所 === 86 === The new complexes W(NtBu)2(NEt)2 and W(NtBu)2(NEtMe)2 were successfully synthesized by reacting W(NtBu)2(NHtBu)2 with excess NHEt2 and NHEtMe. They were used as single-source precursors to deposit thin films by low pressure chemical vapor deposition (LPCVD)....
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/77576579071004584666 |