Study on electrical and structural properties of low temperature boron-and phosphorus-doped polycrystalline silicon thin films prepared by ECR-CVD
碩士 === 國立清華大學 === 電機工程研究所 === 86 ===
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91026061738164382987 |