Temperature Compensation Techniques for High Temperature Rapid Thermal Processor and Fabrication of Si Opto-Electronic Devices Utilizing Room Temperature Processes
博士 === 國立臺灣大學 === 電機工程學系 === 86 === The main topic of this thesis is to discuss the Si dioxide related technologies. The thesis consists of two main parts. The first part is high temperature rapid thermal related oxide. The second part is the fabrication...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1998
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/58915986913867458572 |