Study of the thermal analysis and the improvement in thickness uniformity of rapid thermal oxides
碩士 === 國立臺灣大學 === 電機工程學系研究所 === 86 === As the dimension of devices in ULSI shrinks, in order to minimize the dopant redistribution or grow thin gate oxides, rapid thermal proc ess (RTP) becomes a more and more important tec...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | en_US |
Published: |
1998
|
Online Access: | http://ndltd.ncl.edu.tw/handle/88318092726116487978 |