Study of the thermal analysis and the improvement in thickness uniformity of rapid thermal oxides
碩士 === 國立臺灣大學 === 電機工程學系研究所 === 86 === As the dimension of devices in ULSI shrinks, in order to minimize the dopant redistribution or grow thin gate oxides, rapid thermal proc ess (RTP) becomes a more and more important tec...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88318092726116487978 |