A Study and Control on Wafer Temperature Distribution in a Rapid Thermal Processes

碩士 === 國立臺灣大學 === 機械工程學系 === 86 === A Study and Control on Wafer Temperature Distribution in a Rapid Thermal Processes Abstract In a rapid thermal process, the temperature distribution on a wafer surface directly influences the film deposi...

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Bibliographic Details
Main Authors: LIN, YEN-CHIH, 林彥至
Other Authors: Shui-Shong Lu
Format: Others
Language:zh-TW
Published: 1998
Online Access:http://ndltd.ncl.edu.tw/handle/40092294964760209670