Material Characterization for Semiconductor Spin-on Glass Process
碩士 === 中國文化大學 === 應用化學研究所 === 86 === Abstract SOG technique is widely used in local planarization process insemiconductor manufacturing. In this study, three different kinds of SOGsolutions was characterized for evaluating their applic...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1998
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88351232619886754623 |