STUDY OF POST-TREATMENT EFFECTS ON LOW DIELECTRIC-CONSTANT POLY-ARYLENE ETHERS(PAE-2)

• Main Authors: Hsiao Tsai-Wen, 蕭才文
• Other Authors: Jian-Yang Lin
• Format: Others
• Language: zh-TW
• Published: 1998
• Online Access: http://ndltd.ncl.edu.tw/handle/89462092692440793957

碩士 === 國立雲林科技大學 === 電子與資訊工程技術研究所 === 86 === Low dielectric constant insulator has became a requirement in order to redu cecapacitance delay, power cousumption and cross talk when the devices scaled downto sub-micro regime. A novel PAE-2 (poly arylene ethers) has developed on inter-metal dielectrics and could offer lower dielectric constant than conventional silicon dioxide. We have studied on the effects of post plasma treatment and postiom implantation treatment for PAE-2. From the study we have found that the PAE-2films with functional groups of oxygen linkage taking a proper O2 or N2O oxidativepost plasma treatment have better properties. And fluorinated treatment of PAE-2using CF4 plasma alos could enhance the PAE-2 film. While with N2 plasma treatmentfor PAE-2 films, the dielectric constant of PAE-2 was not lowered. The various ionsources of ion implantation treatments the main bonds of PAE-2 were broken and couldnot be reformed by annealing. So we predict PAE-2 is a kind of thermal concrete polymer. However, PAE-2 films with ion implantation treatment lost main bonds of structure andgot worse properties.