A Rearch on (Ba,Sr)TiO3 Electrodes for DRAM Applications
碩士 === 大葉大學 === 電機工程研究所 === 87 === Abstract These thin films with different Ru/Ti compositions were first prepared by co-sputtering. The Ru/Ti ratio in the alloy was found to strongly affect the resistivity, structure formation and thermal stability. The resistivity of the as-d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/27287945621191854350 |