遠紫外線光酸增幅型正型光阻劑之合成及特性研究

• Main Authors: Sheng-Huei Lin, 林昇輝
• Other Authors: Jui-Hsiang Liu
• Format: Others
• Language: zh-TW
• Published: 1999
• Online Access: http://ndltd.ncl.edu.tw/handle/95894867007583944171

碩士 === 國立成功大學 === 化學工程學系 === 87 === tert-Butyl methacrylate(TBMA) was copolymerized with various comonomers which were selected from MMA, n-BA, MAA, AA, HEMA, VAc. From film physical properties, poly(TBMA-co-HEMA) and poly(TBMA-co-AA-co-n-BA) were selected as resin binders. To introduce double bonds onto the side chain of copolymers, they were further functionalized with acryloyl chloride and glycidyl methacrylate. Copolymers synthesized in this investigation were all identified by using FT-IR. From the UV spectra analyses, it was found that the copolymers and photoacid generator showed different absorption wavelength. From TGA curves, the thermal decomposition temperature of functionalized poly (TBMA-co-AA-co-n-BA) showed only a few difference after crosslinking. The results suggest that the degree of crosslinking is not so large. The thermal decomposition temperature of functionalized poly(TBMA-co- HEMA) showed obvious change before and after crosslinking. Adding a small amount of EGDMA as crosslinking agent could increase the degree of crosslinking. Functionalized poly(TBMA-co-HEMA) was selected as a binder resin in photoresist composition. From exposure characteristic curves, the optimal lithographic condition was achieved as exposed 90 seconds, PEB at 100℃ for 2.5 minutes, and developed in Na2CO3 developer for 30 seconds. The resolution of the positive photoresist was analyzed by optical microscope and SEM.