Effects of Pulsed KrF Laser Annealing and Vacuum Annealing on (111) Preferred Orientantation, Microsturctures and Electrical Resistivity of the Copper Films
碩士 === 國立成功大學 === 材料科學及工程學系 === 87 === Abstract Effects of pulsed KrF laser annealing and vacuum annealing on the preferred orientation, microstructures, and electrical resistivity of Cu films deposited on TiN/Si and TiN/SiO2/Si by electron gun (E-gun) and sputtered gun were st...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/24045302101244793569 |