Study of Interfacial Reactions of Mo/Si0.76Ge0.24
碩士 === 國立成功大學 === 材料科學及工程學系 === 87 === Interfacial reactions of Mo/Si0.76Ge0.24 were studied by pulsed KrF laser annealing as a function of the energy density and pulse number. Vacuum annealing and rapid thermal annealing were also performed on some samples for comparison. Upon vacuum ann...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36126766141239761663 |