Thermal Stability of Cu/SiOF/Si MOS Capacitor
碩士 === 國立交通大學 === 電子工程系 === 87 === This thesis studies the thermal stability of Cu/SiOF/Si capacitor with and without Ta-nitride (TaN) barrier layer. The SiOF films were deposited by plasma-enhanced chemical vapor deposition (PECVD) with the process gases of tetraethylorthosilicate (TEOS)...
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| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83128453027426945892 |