Characteristics of CVD TEOS Oxide Deposited on Disilane Polysilicon and Stacked Polysilicon Films
碩士 === 國立交通大學 === 電子工程系 === 87 === In this thesis, we investigate the CVD TEOS polyoxides deposited on disilane polysilicon films and stacked polysilicon films with rapid thermal N2O (RTN2O) annealing. It is found that the smoother polysilicon/polyoxide interface can be obtained by replac...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1999
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/40679578418224433911 |